SELETE-Semiconductor Leading Edge Technologies

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Selete was founded in 1996 as a consortium for development of production technologies using 300mm wafer equipments with equal capital investment from 10 semiconductor manufacturers.

Selete: Semiconductor Leading Edge Technologies

	[Research Result]　Exhaustive and systematic accuracy verification and enhancement of STI stress compact model for general realistic layout patterns	8/2/2010
	[Research Result]　Possible Origins of Extra Threshold Voltage Variability in N-Type Field-Effect Transistors by Intentionally Changing Process Conditions and Using Takeuchi plot	7/20/2010
	[Research Result]　Flare Correction in EUV Lithography for half pitch 22nm	7/12/2010
	[Research Result]　Analysis and Prospect of Local Variability of Drain Current in Scaled MOSFETs by a New Decomposition Method	6/16/2010

	The link was pasted to M/C net HP in MIRAI project HP	5/29/2007
	Corporate logo was renewed.	4/1/2006
	Selete homepage was renewed	4/1/2006
	Annual Report 2005 has been uploaded in the public information page.	4/1/2006